DocumentCode :
3460703
Title :
Electromechanical resonances of SiC and AlN beams under ambient conditions
Author :
Brueckner, K. ; Förster, Ch ; Tonisch, K. ; Cimalla, V. ; Ambacher, O. ; Stephan, R. ; Blau, K. ; Hein, M.A.
Author_Institution :
Dept. for RF & Microwave Techniques, Technische Univ. Ilmenau, Germany
Volume :
3
fYear :
2005
fDate :
4-6 Oct. 2005
Abstract :
MEMS resonators offer great potential for RF sensor and filter applications. A semiconductor process has been used to prepare SiC and AlN beam resonators. The metallised beams are excited by an RF current in a permanent magnetic field. The resonant response is detected by the induced voltage. Despite the weakness of the signal, accurate detection has been achieved in the time domain, under ambient conditions in a magnetic field of about 0.5 T. The resonant response bears valuable information on the structural quality of the material and identifies potential for further improvement. The time domain technique presents an elegant approach to sensing applications.
Keywords :
III-V semiconductors; aluminium compounds; micromechanical resonators; microsensors; silicon compounds; time-domain synthesis; wide band gap semiconductors; AlN; MEMS resonators; RF sensor; SiC; ambient conditions; beam resonators; electromechanical resonances; filter application; metallised beams; permanent magnetic field; resonant response; semiconductor process; structural quality; time domain technique; Electromechanical sensors; Magnetic fields; Magnetic materials; Magnetic resonance; Magnetic sensors; Magnetic separation; Micromechanical devices; Radio frequency; Resonator filters; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2005 European
Print_ISBN :
2-9600551-2-8
Type :
conf
DOI :
10.1109/EUMC.2005.1610243
Filename :
1610243
Link To Document :
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