Title :
Yield methodology-three phases approach
Author :
Pouedras, Thierry ; Ben-Tzur, Mira
Author_Institution :
Cypress Semicond., San Jose, CA, USA
Abstract :
A novel yield methodology approach is developed. This methodology is applicable to each of the three phases from technology development to manufacturing. This methodology highlights the goals for each phase and describes all the procedures needed for optimizing the learning rate and reducing the cycle time between technology development and manufacturing
Keywords :
integrated circuit testing; integrated circuit yield; production testing; quality control; IC manufacture; cycle time reduction; learning rate optimisation; semiconductor manufacturing; technology development; three phases approach; yield methodology; Continuous production; Failure analysis; Manufacturing processes; Optimized production technology; Pareto analysis; Qualifications; Scanning electron microscopy; Semiconductor device manufacture; Silicon; Software testing;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-5217-3
DOI :
10.1109/ASMC.1999.798171
