DocumentCode
3461664
Title
A process for fabricating robust electrothermal micromirrors with customizable thermal response time and power consumption
Author
Pal, Shovon ; Xie, Huan
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
fYear
2011
fDate
8-11 Aug. 2011
Firstpage
157
Lastpage
158
Abstract
A novel process for fabricating robust electrothermal bimorph based MEMS devices is reported and scanning electrothermal micromirrors are fabricated. Device parameters can be chosen to customize thermal response time and power requirements. Aluminum (Al) and Tungsten (W) form the active bimorph layers and polyimide is used for thermal isolation.
Keywords
aluminium; micro-optomechanical devices; micromirrors; optical fabrication; tungsten; MEMS devices; active bimorph layers; electrothermal bimorph; electrothermal micromirrors; power consumption; thermal isolation; thermal response time; Actuators; Micromirrors; Polyimides; Robustness; Silicon; MEMS; electrothermal; micromirror; robust;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OMN), 2011 International Conference on
Conference_Location
Istanbul
ISSN
2160-5033
Print_ISBN
978-1-4577-0334-8
Type
conf
DOI
10.1109/OMEMS.2011.6031066
Filename
6031066
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