• DocumentCode
    3462537
  • Title

    Improving hot-electron reliability through circuit analysis and design

  • Author

    Wang, Hai ; De, Himadri ; Lahri, Rajeeva ; Haueisen, Don

  • Author_Institution
    Nat. Semicond. Co., Santa Clara, CA, USA
  • fYear
    1991
  • fDate
    9-11 April 1991
  • Firstpage
    107
  • Lastpage
    111
  • Abstract
    On-chip hot-electron test/stress structures have been developed. These structures provide insight into device degradation under real circuit operation. This makes it possible to accurately predict device lifetime in a specific circuit application. A methodology leading to novel hot-electron design guidelines is proposed based on the device operating conditions and its susceptibility to hot-electron effects. By following these guidelines, circuit reliability can be improved without adversely affecting circuits performance. The correlation between device and circuit degradation has been obtained through subcircuit analysis and simulation. As a result, hot-electron circuit lifetime can be used as one of the design parameters to insure long term reliability of the circuit. An example of reliability through design is given.<>
  • Keywords
    circuit reliability; hot carriers; integrated circuit testing; monolithic integrated circuits; circuit analysis; circuit reliability; device degradation; device lifetime; hot-electron reliability; long term reliability; operating conditions; subcircuit analysis; Circuit analysis; Circuit testing; Degradation; Frequency; Guidelines; Inverters; MOS devices; MOSFET circuits; Reliability engineering; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1991, 29th Annual Proceedings., International
  • Conference_Location
    Las Vegas, NV, USA
  • Print_ISBN
    0-87942-680-2
  • Type

    conf

  • DOI
    10.1109/RELPHY.1991.145995
  • Filename
    145995