DocumentCode
3462537
Title
Improving hot-electron reliability through circuit analysis and design
Author
Wang, Hai ; De, Himadri ; Lahri, Rajeeva ; Haueisen, Don
Author_Institution
Nat. Semicond. Co., Santa Clara, CA, USA
fYear
1991
fDate
9-11 April 1991
Firstpage
107
Lastpage
111
Abstract
On-chip hot-electron test/stress structures have been developed. These structures provide insight into device degradation under real circuit operation. This makes it possible to accurately predict device lifetime in a specific circuit application. A methodology leading to novel hot-electron design guidelines is proposed based on the device operating conditions and its susceptibility to hot-electron effects. By following these guidelines, circuit reliability can be improved without adversely affecting circuits performance. The correlation between device and circuit degradation has been obtained through subcircuit analysis and simulation. As a result, hot-electron circuit lifetime can be used as one of the design parameters to insure long term reliability of the circuit. An example of reliability through design is given.<>
Keywords
circuit reliability; hot carriers; integrated circuit testing; monolithic integrated circuits; circuit analysis; circuit reliability; device degradation; device lifetime; hot-electron reliability; long term reliability; operating conditions; subcircuit analysis; Circuit analysis; Circuit testing; Degradation; Frequency; Guidelines; Inverters; MOS devices; MOSFET circuits; Reliability engineering; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1991, 29th Annual Proceedings., International
Conference_Location
Las Vegas, NV, USA
Print_ISBN
0-87942-680-2
Type
conf
DOI
10.1109/RELPHY.1991.145995
Filename
145995
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