DocumentCode :
3462616
Title :
An assessment of the performance for double gate Schottky barrier MOSFETs with modulated back gate
Author :
Zhai, Yu-Jia ; Kang, Jin-Feng ; Du, Gang ; Han, Ru-qi ; Liu, Xiao-Yan
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing
fYear :
2006
fDate :
23-26 Oct. 2006
Firstpage :
87
Lastpage :
89
Abstract :
A new structure of double gate SB MOSFET in which one of the gates is used to modulate the electric potential distribution (back gate modulated SB MOSFET) is proposed and compared with conventional double gate SB MOSFET and UTB SB MOSFET in terms of off state leakage current, on state current and minimum current, as well as sub-threshold slope(S). The mechanism of SB MOSFET leakage current in off state is analyzed. The influence of back gate voltage on the performance of the SB MOSFETs with various parameters of channel doping, Schottky barrier height and the scalability is investigated. The results can provide a design guideline for further devices optimization
Keywords :
MOSFET; Schottky barriers; leakage currents; optimisation; Schottky barrier height; back gate voltage; channel doping; devices optimization; double gate Schottky barrier MOSFET; electric potential distribution modulation; modulated back gate; state leakage current; CMOS technology; Charge carrier processes; Leakage current; MOSFETs; Microelectronics; Schottky barriers; Silicides; Silicon; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306085
Filename :
4098029
Link To Document :
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