DocumentCode :
3463248
Title :
Study of body contact of partial depleted SOI NMOS devices
Author :
Cai, Xiaowu ; Hai, Chaohe
Author_Institution :
Inst. of Microelectron., Chinese Acad. & Sci., Beijing
fYear :
2006
fDate :
23-26 Oct. 2006
Firstpage :
212
Lastpage :
214
Abstract :
SOI partially depleted NMOS devices with C shape gate, H shape gate, BTS, and T shape gate body contact are fabricated, and their ability to suppress kink effect is studied. C shape gate body contact device expresses better performance to inhibit kink effect than H shape and BTS body contact devices, while T shape device shows the worst performance. As the channel width increases, all partially depleted NMOS devices express kink effect because of the larger body contact resistance of the p type neutral region under the gate. Then the numbers of body contact and the distance of body contact are two major factors to affect devices´ ability to suppress kink effect
Keywords :
MOSFET; contact resistance; kink bands; silicon-on-insulator; C shape gate; H shape gate; T shape gate body contact; body contact resistance; kink effect; p type neutral region; partial depleted SOI NMOS devices; CMOS process; CMOS technology; Charge carrier processes; Contact resistance; Fabrication; Immune system; Impact ionization; MOS devices; Shape; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306164
Filename :
4098064
Link To Document :
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