DocumentCode :
3463756
Title :
Micromechanical resonators for oscillators and filters
Author :
Nguyen, Clark T C
Author_Institution :
Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI, USA
Volume :
1
fYear :
1995
fDate :
7-10 Nov 1995
Firstpage :
489
Abstract :
Fully monolithic, high-Q, micromechanical signal processors are described. A completely monolithic high-Q oscillator, fabricated via a combined CMOS plus surface micromachining technology, is detailed, for which the oscillation frequency is controlled by a polysilicon micromechanical resonator to achieve high stability. The operation and performance of mechanical resonators are modelled, with emphasis on circuit and noise modelling. Micromechanical filter design is described, and a prototype two-resonator bandpass filter is demonstrated. An integrated micro-oven that stabilizes the resonance frequency against temperature variations using only 2 mW of power is reviewed. Brownian motion and mass loading phenomena are shown to have a greater influence on short-term stability and dynamic range in this micro-scale. Scaling strategies are proposed to alleviate potential limitations due to Brownian noise
Keywords :
Brownian motion; CMOS analogue integrated circuits; Q-factor; band-pass filters; circuit noise; circuit stability; electromechanical filters; equivalent circuits; frequency stability; micromachining; micromechanical resonators; passive filters; radiofrequency oscillators; resonator filters; thermal noise; thermal stability; 2 mW; Brownian motion; Brownian noise; CMOS; Si; circuit modelling; dynamic range; high stability; integrated micro-oven; mass loading phenomena; micromechanical filter design; micromechanical resonators; micromechanical signal processors; monolithic high-Q oscillator; noise modelling; oscillation frequency control; polysilicon micromechanical resonator; scaling strategies; short-term stability; surface micromachining technology; temperature variations; two-resonator bandpass filter; Band pass filters; CMOS technology; Frequency; Integrated circuit technology; Micromachining; Micromechanical devices; Oscillators; Resonator filters; Semiconductor device modeling; Signal processing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 1995. Proceedings., 1995 IEEE
Conference_Location :
Seattle, WA
ISSN :
1051-0117
Print_ISBN :
0-7803-2940-6
Type :
conf
DOI :
10.1109/ULTSYM.1995.495626
Filename :
495626
Link To Document :
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