Title :
2GHz 2Mb 2T Gain-Cell Memory Macro with 128GB/s Bandwidth in a 65nm Logic Process
Author :
Somasekhar, Dinesh ; Ye, Yibin ; Aseron, Paolo ; Lu, Shih-Lien ; Khellah, Muhammad ; Howard, Jason ; Ruhl, Greg ; Karnik, Tanay ; Borkar, Shekhar Y. ; De, Vivek ; Keshavarzi, Ali
Author_Institution :
Intel, Hilsboro, OR
Abstract :
As silicon technology scales, the possibility of fabricating dense memories is of great interest, particularly if the solution has low to no additional process cost. We demonstrate a 2Mb 2T gain-cell macro with 128GB/s bandwidth, fast 2ns cycle time, operating at 2GHz in a native 65nm logic process. Fast read access and cycle times are critical in lookup applications such as tag RAMs in microprocessors where read queries are abundant. In such a scenario replacing SRAM with a denser fast memory is desired. The 2T fully pipelined gain-cell macro features non-destructive read, partial-write support and sustains 8-cycle successive access to the same memory bank. The macro is fabricated in a high-performance 65nm process featuring 1.2nm nitrided gate oxide, 35nm gate length, enhanced channel strain, NiSi silicide, 8 layers of Cu metal interconnect, and low-K ILD enabling data-buses from the memory banks to run as high as 2GHz. This technology has a 0.57 mum2 6T SRAM cell. All internal circuits of the macro operate with a logic-compatible nominal IV supply with the exception of wordline drivers.
Keywords :
SRAM chips; logic design; 2T fully pipelined gain-cell macro; 2T gain-cell memory macro; 6T SRAM cell; cycle times; frequency 2 GHz; logic process; lookup applications; memory bank; nitrided gate oxide; read access time; silicon technology; size 65 nm; storage capacity 2 Mbit; time 2 ns; wordline drivers; Bandwidth; Capacitive sensors; Costs; Driver circuits; Integrated circuit interconnections; Logic; Microprocessors; Random access memory; Silicides; Silicon;
Conference_Titel :
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2010-0
Electronic_ISBN :
978-1-4244-2011-7
DOI :
10.1109/ISSCC.2008.4523163