Microfluidics integrable plasma source powered by a silicon through-substrate split-ring resonator

A novel microplasma source, based on a microstrip split-ring resonator design with electrodes integrated in its silicon substrate, was designed, manufactured and evaluated. This device should offer straightforward integration with other MEMS components, and has a plasma discharge gap with a controlled volume and geometry, with potential for microfluidics. Two realized devices were resonant at around 2.9 GHz with quality factors of 26.6 and 18.7. Two different plasma ignition modes were observed, where the plasma at low pressures was not confined to the gap but rather appeared between the ends of the electrodes on the backside.