Title :
High-Efficiency Class-F Amplifier Design Using Defected Ground Structure
Author :
Yoo, Chae-Up ; Kim, Min-su ; Yang, Youngoo
Author_Institution :
Dept. of Mobile Commun. Eng., Sungkyunkwan Univ., Suwon, South Korea
fDate :
June 30 2009-July 2 2009
Abstract :
Recently at home and abroad mobile communication system has been rapidly developed. What draws our attention is the issue that systems which had been installed on the ground are gradually going up to the top of tower. Most designers must have long sought to get rid of the loss which occurs while moving up and down from an antenna installed on the top of tower to the system on the ground. In an attempt to remove the loss, the designers have used the feeder line combiner as a part which uses feeder cable for public use that connects an antenna to the system on the ground. The effort to improving the loss even in the feeder line combiner, however is still going on and it is just to move Amplifier to the top of tower from the ground. The improved loss by the change of system will attract a good deal of attention to higher efficiency Class-F Amplifier. When it comes to designing the previous structure of Class-F amplifier, the structure of Harmonic Control circuit considering Transistor parasitic parameters, made it possible to embody high efficiency. This study aims at the lightweight product. The secondary Harmonic matching structure was designed with using DGS(Defected Ground Structure).
Keywords :
UHF power amplifiers; cables (electric); harmonic analysis; mobile communication; antenna connection; class-F amplifier; defected ground structure; feeder cable; feeder line combiner; harmonic control circuit; mobile communication; secondary harmonic matching structure; transistor parasitic parameters; Circuits; Design engineering; Etching; Frequency; Impedance; Mobile communication; Poles and towers; Power transmission lines; Size control; Voltage; Amplifier; Class F; DGS;
Conference_Titel :
New Trends in Information and Service Science, 2009. NISS '09. International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-0-7695-3687-3
DOI :
10.1109/NISS.2009.138