Title :
An All-Digital On-Chip Process-Control Monitor for Process-Variability Measurements
Author :
Klass, Fabian ; Jain, Ashish ; Hess, Greg ; Park, Brian
Author_Institution :
P. A. Semi, Santa Clara, CA
Abstract :
Process variability has become a major challenge in nanometer technologies. Understanding process variability is therefore a key to designing successful low-power multi-million gate SoCs. An all-digital on-chip process control-monitor (PCM) that measures process variability is described.
Keywords :
CMOS logic circuits; integrated circuit design; integrated circuit measurement; statistical analysis; system-on-chip; CMOS process; all-digital on-chip process-control monitor; low-power multimillion gate SoC design; nanometer technologies; process-variability measurements; statistics; CMOS process; Circuit testing; Clocks; Frequency; Inverters; Jitter; MOS devices; Monitoring; Phase change materials; Temperature;
Conference_Titel :
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2010-0
Electronic_ISBN :
978-1-4244-2011-7
DOI :
10.1109/ISSCC.2008.4523230
