DocumentCode :
3465312
Title :
Compact In-Situ Sensors for Monitoring Negative-Bias-Temperature-Instability Effect and Oxide Degradation
Author :
Karl, E. ; Singh, P. ; Blaauw, D. ; Sylvester, D.
Author_Institution :
Univ. of Michigan, Ann Arbor, MI
fYear :
2008
fDate :
3-7 Feb. 2008
Firstpage :
410
Lastpage :
623
Abstract :
The NBTI sensor proposed is intended to be used for general NBTI characterization and not in- situ monitoring of degradation, due to large area overhead (~450x area of NBTI sensor in this work), inability to correct for temperature variations encountered during operation and the analog output of the sensor. We introduce two compact structures to digitally quantify the change in performance and power of devices undergoing NBTI and defect-induced oxide breakdown. The small size of the sensors makes them amenable to use in a standard-cell design with low area and power overhead. The sensors can be implemented in large numbers to collect data on degradation and statistical performance of the devices.
Keywords :
statistical analysis; temperature measurement; temperature sensors; thermal stability; NBTI sensor; analog output; compact in-situ sensors; defect-induced oxide breakdown; negative-bias-temperature-instability effect; oxide degradation; statistical performance; Calibration; Degradation; Frequency; MOS devices; Monitoring; Niobium compounds; Oscillators; Stress; Temperature sensors; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2010-0
Electronic_ISBN :
978-1-4244-2011-7
Type :
conf
DOI :
10.1109/ISSCC.2008.4523231
Filename :
4523231
Link To Document :
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