Title :
An improved CMOS-compatible bulk-silicon-micromachined microemitter for dynamic infrared scene projector
Author :
Ma, Bin ; Pingzhi Liang ; Si, Junjie ; Chen, Erzhu ; Chen, Shijun ; Zhang, Xuemin ; Ding, Yi
Author_Institution :
Shanghai Inst. of Tech. Phys.
Abstract :
An improved thermally isolated bulk-silicon-micromachined microemitter that can be applied for dynamic infrared scene projectors has been fabricated using commercial CMOS process followed by single step of post anisotropic silicon etching of TMAH mixture without any additional protection of aluminum pads. The physical structure and fabrication process of microemitter is optimized to ensure high apparent temperature, fast response and high temperature survivability of emitter element along with low-cost, high-yield of manufacturing
Keywords :
etching; infrared detectors; micromachining; TMAH mixture; apparent temperature; bulk silicon micromachined microemitter; commercial CMOS process; dynamic infrared scene projector; fabrication process; improved CMOS-compatible microemitter; microheater; physical structure; post anisotropic silicon etching; thermally isolated microemitter; Aluminum; Anisotropic magnetoresistance; CMOS process; Etching; Fabrication; Layout; Manufacturing processes; Protection; Silicon; Temperature;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
DOI :
10.1109/ICSICT.2006.306395
