DocumentCode
3466492
Title
Discussion on the CHE Programming Characteristics with the Scaling Down of Charge Trapping Flash Memory
Author
Sun, Lei ; Pan, Liyang ; Luo, Xian ; Wu, Dong ; Zhu, Jun
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
824
Lastpage
826
Abstract
The scaling down issues in the charge trapping memory are investigated in this work. In the sub-100 nm devices, the punch-through problem, as well as high program voltage and electrical field limitation are studied by device simulation and measurement. The authors found CHE program mechanism meet certain limitation in the future short channel devices. Furthermore, program induced charge distribution is extracted by a charge pumping method, and the related problems to the multi-bit application is discussed
Keywords
flash memories; hot carriers; CHE programming; channel hot electrons; charge distribution; charge pumping; charge trapping; device simulation; flash memory; punch-through problem; CMOS technology; Channel hot electron injection; Flash memory; Microelectronics; Nonvolatile memory; Random access memory; SONOS devices; Sun; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306519
Filename
4098246
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