• DocumentCode
    3466492
  • Title

    Discussion on the CHE Programming Characteristics with the Scaling Down of Charge Trapping Flash Memory

  • Author

    Sun, Lei ; Pan, Liyang ; Luo, Xian ; Wu, Dong ; Zhu, Jun

  • Author_Institution
    Inst. of Microelectron., Tsinghua Univ., Beijing
  • fYear
    2006
  • fDate
    23-26 Oct. 2006
  • Firstpage
    824
  • Lastpage
    826
  • Abstract
    The scaling down issues in the charge trapping memory are investigated in this work. In the sub-100 nm devices, the punch-through problem, as well as high program voltage and electrical field limitation are studied by device simulation and measurement. The authors found CHE program mechanism meet certain limitation in the future short channel devices. Furthermore, program induced charge distribution is extracted by a charge pumping method, and the related problems to the multi-bit application is discussed
  • Keywords
    flash memories; hot carriers; CHE programming; channel hot electrons; charge distribution; charge pumping; charge trapping; device simulation; flash memory; punch-through problem; CMOS technology; Channel hot electron injection; Flash memory; Microelectronics; Nonvolatile memory; Random access memory; SONOS devices; Sun; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306519
  • Filename
    4098246