• DocumentCode
    3466978
  • Title

    Reliability of novel die attach adhesive for snap curing

  • Author

    Galloway, David P. ; Grosse, Michael ; Nguyen, My N. ; Burkhart, A.

  • Author_Institution
    Motorola Inc., Tempe, AZ, USA
  • fYear
    1995
  • fDate
    2-4 Oct 1995
  • Firstpage
    141
  • Lastpage
    147
  • Abstract
    Novel adhesive, using in-line process, has been shown to reduce adhesive cure cycle time from 70 minutes to as little as 44 seconds at 160°C. Throughput improvement of 60% using existing box ovens and no increase in floor space has been confirmed on production equipment. The adhesive is based upon a modified cyanate ester resin, which cures to form a triazine polymer with excellent temperature stability and unique moisture properties. It generates 75% less outgassing during cure than typical snap sure epoxies, which reduces contamination of the chip, leadframe and oven chamber. Live device reliability, equivalent to standard box oven, has been demonstrated for the new snap cure adhesive using in-line cure, as well as, fast box oven process. Material, processing and qualification data is summarized and compared to epoxies for analog and logic ICs packaged in SOIC, PDIP, and PLCC body styles. The material has been fully qualified and is in production use
  • Keywords
    adhesion; integrated circuit packaging; integrated circuit reliability; microassembling; ovens; plastic packaging; production testing; 160 degC; 44 s; PDIP; PLCC body styles; SOIC; adhesive cure cycle time; box ovens; cyanate ester resin; die attach adhesive; in-line cure; live device reliability; moisture properties; outgassing; plastic packaging; production equipment; qualification data; snap curing; temperature stability; triazine polymer; Curing; Microassembly; Moisture; Ovens; Polymers; Production equipment; Resins; Stability; Temperature; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1995. 'Manufacturing Technologies - Present and Future', Seventeenth IEEE/CPMT International
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-2996-1
  • Type

    conf

  • DOI
    10.1109/IEMT.1995.526106
  • Filename
    526106