Title :
F6: Transistor Variability in Nanometer-Scale Technologies
Author_Institution :
Sun Microsystems, Menlo Park, CA
Keywords :
Computer architecture; Design engineering; Design for manufacture; Design optimization; Integrated circuit technology; Lithography; Logic design; Manufacturing; Transistors; Very large scale integration;
Conference_Titel :
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2010-0
Electronic_ISBN :
978-1-4244-2011-7
DOI :
10.1109/ISSCC.2008.4523330
