• DocumentCode
    3467317
  • Title

    Two-Dimensional Analysis of the Surface Trap Effect on Gate Lag Phenomena in 4H-SiC MESFET

  • Author

    Xiaochuan, Deng ; Bo, Zhang ; Li Zhaoji ; ZhuangLiang, Chen

  • Author_Institution
    Center of IC Design, China Univ. of Electron. Sci. & Technol., Chengdu
  • fYear
    2006
  • fDate
    Oct. 2006
  • Firstpage
    941
  • Lastpage
    943
  • Abstract
    The surface-trap effect on the gate lag in 4H-SiC MESFET´s is investigated by a two-dimensional device simulation, and the DC and gate lag characteristics dependence on the trap level and the surface trap density have been studied. It is shown that the drain saturation current are reduced by the presence of surface traps. When the the energy level of the surface traps is located in the lower half of the energy gap, the gate lag becomes remarkable. This is because the thickness of surface depletion region can significantly change with the applied gate voltage. As a result, devices with lower surface state density can efficiently degrade the gate lag phenomenon
  • Keywords
    Schottky gate field effect transistors; energy gap; silicon compounds; surface states; wide band gap semiconductors; 2D device simulation; 4H-SiC MESFET; DC characteristics; SiC; drain saturation current; energy gap; energy level; gate lag characteristics; gate lag phenomena; surface depletion region; surface state density; surface trap density; surface trap effect; Analytical models; Charge carrier processes; Degradation; Electron traps; Energy states; MESFET integrated circuits; Poisson equations; Semiconductor process modeling; Silicon carbide; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306601
  • Filename
    4098284