DocumentCode
3467789
Title
Fabrication of IR Reflectors by Porous Silicon Technique
Author
Wang, Zhejin ; Wang, Lianwei ; Zheng, Yuxiang ; Xiaoshuang Chen
Author_Institution
Dept. of Electron., East China Normal Univ., Shanghai
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
1010
Lastpage
1012
Abstract
Omnidirectional mirrors worked in mid-infrared made by periodically repeating two different refractive index layers of fully and partially oxidized porous silicon have been reported. A reflector structural with good thermal isolation properties is proposed in this report. Oxidation properties of porous silicon multilayer structure have been investigated and the oxidization behavior as well as its microstructure has been investigated
Keywords
mirrors; porous semiconductors; refractive index; silicon; IR reflectors; Si; omnidirectional mirrors; oxidation properties; oxidization behavior; porous silicon multilayer structure; reflector structural; refractive index layers; thermal isolation properties; Current density; Etching; Mirrors; Nonhomogeneous media; Optical device fabrication; Optical refraction; Optical variables control; Oxidation; Refractive index; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306645
Filename
4098306
Link To Document