DocumentCode
3468980
Title
Study of CF4 capacitive plasma chemistry through mass spectrometry technique and global model
Author
Toneli, David A. ; Pessoa, R.S. ; Roberto, Marisa ; Petraconi, Gilberto ; Maciel, H.S.
Author_Institution
Technol. Inst. of Aeronaut., São José dos Campos, Brazil
fYear
2013
fDate
16-21 June 2013
Firstpage
1
Lastpage
4
Abstract
In this work the chemistry of CF4 capacitive plasma is studied. For this, experimental measurements were made by mass spectrometry technique which allowed the analysis of neutral species generated during the fragmentation of the source gas by the electrical gas discharge. Additionally, we use global model simulations in order to complement the experimental results, allowing to discern the main chemical processes occurring in the CF4 plasma. The global model developed here considers the main chemical reactions in CF4 plasma: momentum transfer, vibrational, ionization, dissociation, electron attachment and loss, recombination between charged and neutral species in the gas phase and the reactor walls.
Keywords
discharges (electric); dissociation; electron attachment; ionisation; mass spectroscopic chemical analysis; organic compounds; plasma chemistry; plasma simulation; plasma-wall interactions; capacitive plasma chemistry; charged-neutral species recombination; chemical processes; chemical reactions; dissociation; electrical gas discharge; electron attachment; electron loss; gas phase; global model simulations; ionization; mass spectrometry; momentum transfer; reactor walls; source gas fragmentation; vibration; Chemistry; Discharges (electric); Equations; Inductors; Ions; Plasma measurements; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference (PPC), 2013 19th IEEE
Conference_Location
San Francisco, CA
ISSN
2158-4915
Type
conf
DOI
10.1109/PPC.2013.6627595
Filename
6627595
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