• DocumentCode
    3468980
  • Title

    Study of CF4 capacitive plasma chemistry through mass spectrometry technique and global model

  • Author

    Toneli, David A. ; Pessoa, R.S. ; Roberto, Marisa ; Petraconi, Gilberto ; Maciel, H.S.

  • Author_Institution
    Technol. Inst. of Aeronaut., São José dos Campos, Brazil
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this work the chemistry of CF4 capacitive plasma is studied. For this, experimental measurements were made by mass spectrometry technique which allowed the analysis of neutral species generated during the fragmentation of the source gas by the electrical gas discharge. Additionally, we use global model simulations in order to complement the experimental results, allowing to discern the main chemical processes occurring in the CF4 plasma. The global model developed here considers the main chemical reactions in CF4 plasma: momentum transfer, vibrational, ionization, dissociation, electron attachment and loss, recombination between charged and neutral species in the gas phase and the reactor walls.
  • Keywords
    discharges (electric); dissociation; electron attachment; ionisation; mass spectroscopic chemical analysis; organic compounds; plasma chemistry; plasma simulation; plasma-wall interactions; capacitive plasma chemistry; charged-neutral species recombination; chemical processes; chemical reactions; dissociation; electrical gas discharge; electron attachment; electron loss; gas phase; global model simulations; ionization; mass spectrometry; momentum transfer; reactor walls; source gas fragmentation; vibration; Chemistry; Discharges (electric); Equations; Inductors; Ions; Plasma measurements; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference (PPC), 2013 19th IEEE
  • Conference_Location
    San Francisco, CA
  • ISSN
    2158-4915
  • Type

    conf

  • DOI
    10.1109/PPC.2013.6627595
  • Filename
    6627595