DocumentCode :
3469333
Title :
3D stacked power distribution considering substrate coupling
Author :
Shayan, Amirali ; Hu, Xiang ; Zhang, Wanping ; Cheng, Chung-Kuan ; Engin, A. Ege ; Chen, Xiaoming ; Popovich, Mikhail
Author_Institution :
Univ. of California, San Diego, CA, USA
fYear :
2009
fDate :
4-7 Oct. 2009
Firstpage :
225
Lastpage :
230
Abstract :
Reliable design of power distribution network for stacked integrated circuits introduces new challenges i.e., substrate coupling among through silicon vias (TSVs) and tiers grid in addition to reliability issues such as electromigration and thermo-mechanical stress, compared to conventional system on chip (SoC). In this paper a comprehensive modeling of the TSV and stacked power grid with frequency dependent parasitic is proposed. The analytical model considers the impact of the substrate coupling between the TSVs and layers grid. A frequency domain based analysis flow is introduced to incorporate frequency dependent parasitics. The design of a reliable power distribution network is formulated as an optimization problem to minimize power noise under reliability and electro-migration constraints. Experimental results demonstrate the efficacy of the problem formulation and solution technique.
Keywords :
circuit noise; circuit optimisation; frequency-domain analysis; power distribution reliability; power grids; three-dimensional integrated circuits; 3D stacked power distribution; electro-migration constraint; frequency dependent parasitic; frequency domain based analysis flow; optimization; power noise minimization; reliable power distribution network; stacked integrated circuit; stacked power grid; substrate coupling; through silicon vias; Coupling circuits; Electromigration; Frequency dependence; Integrated circuit reliability; Power distribution; Power system reliability; Power systems; Silicon; Thermal stresses; Thermomechanical processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer Design, 2009. ICCD 2009. IEEE International Conference on
Conference_Location :
Lake Tahoe, CA
ISSN :
1063-6404
Print_ISBN :
978-1-4244-5029-9
Electronic_ISBN :
1063-6404
Type :
conf
DOI :
10.1109/ICCD.2009.5413151
Filename :
5413151
Link To Document :
بازگشت