Innovative precise-environment design and technology of removing the pollutant from a clean room

The innovative precise-environment design in this study can reduce the leakage at the machine STI load lock outlet effectively and can remove the pollution source within a short period of time, so as to minimize the AMC in the clean room. This not only reduces the amount of product defects but also contributes greatly to the yield. The practical validation after the precise environment was installed showed that the Cl- concentration was reduced from 1.057 to 0.04 ppbv, indicating an improvement rate of as high as 96%. Therefore, this study evaluated the feasibility of installing a precise environment in on-site AMC heavy contamination machines, as well as for important machines used for metal etching, poly etching, BP TEOS, and so on. The results of this study contributed to the control of micro contamination in clean room environments significantly and increased the benefits of enhancing machine stability, increasing the process yield, and reducing wafer defects.