DocumentCode
3472597
Title
Technology Platform for IC Design in Nano-scale CMOS
Author
Cheng, Y.
Author_Institution
Shanghai Res. Inst. of Microelectron., Peking Univ., Beijing
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
1837
Lastpage
1840
Abstract
This paper discusses the technology platform development for IC design in nano-CMOS technologies. New effects and issues in nano-CMOS are reviewed before the discussion on the contents of the technology platform. Some key components are briefly discussed with the exploration of some further challenges to develop a RF SOC design technology platform. An advanced technology platform with strong links to process and device behavior and efficient simulation approaches is critical to a successful advanced IC design in nano-scale CMOS technologies
Keywords
CMOS integrated circuits; integrated circuit design; nanoelectronics; system-on-chip; integrated circuit design; nanoscale CMOS technology; system-on-chip; CMOS integrated circuits; CMOS process; CMOS technology; Chromium; Design methodology; Manufacturing processes; Nanoscale devices; Optimized production technology; Process design; System-on-a-chip;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306461
Filename
4098557
Link To Document