Title :
Technology Platform for IC Design in Nano-scale CMOS
Author_Institution :
Shanghai Res. Inst. of Microelectron., Peking Univ., Beijing
Abstract :
This paper discusses the technology platform development for IC design in nano-CMOS technologies. New effects and issues in nano-CMOS are reviewed before the discussion on the contents of the technology platform. Some key components are briefly discussed with the exploration of some further challenges to develop a RF SOC design technology platform. An advanced technology platform with strong links to process and device behavior and efficient simulation approaches is critical to a successful advanced IC design in nano-scale CMOS technologies
Keywords :
CMOS integrated circuits; integrated circuit design; nanoelectronics; system-on-chip; integrated circuit design; nanoscale CMOS technology; system-on-chip; CMOS integrated circuits; CMOS process; CMOS technology; Chromium; Design methodology; Manufacturing processes; Nanoscale devices; Optimized production technology; Process design; System-on-a-chip;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
DOI :
10.1109/ICSICT.2006.306461
