Implementation of TCAD-for-Manufacturing Methodology using Process Compact Models

Author

Borges, Ric ; Ma, Terry ; Ng, Wei-Choon ; Krishnamurthy, Sathya ; Bomholt, Lars

Author_Institution

Silicon Eng. Group, Synopsys, Inc., Mountain View, CA

fYear

2006

fDate

23-26 Oct. 2006

Firstpage

1853

Lastpage

1856

Abstract

We report a complete TCAD methodology that addresses the considerable manufacturing challenges posed by rising technological complexity, increasing process variability and shrinking time-to-market windows. Using TCAD simulations as input, process compact models are created to enable efficient analysis of complex and multivariate process-device relationships, with applications to enhancing process manufacturability and process control. The methodology is illustrated with two case studies for 90nm CMOS and edge emitting laser technologies

Keywords

CMOS integrated circuits; process control; semiconductor process modelling; technology CAD (electronics); 90 nm; CMOS technologies; TCAD simulations; TCAD-for-manufacturing methodology; edge emitting laser technologies; process compact models; process control; process manufacturability; CMOS technology; Computer aided manufacturing; Costs; Manufacturing processes; Phase change materials; Predictive models; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor process modeling; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on

Conference_Location

Shanghai

Print_ISBN

1-4244-0160-7

Electronic_ISBN

1-4244-0161-5

Type

conf

DOI

10.1109/ICSICT.2006.306487

Filename

4098561