DocumentCode
3475756
Title
Residual resistivity model and its application
Author
Doyen, L. ; Federspiel, X. ; Ney, D. ; Sers, G. ; Giraulf, V. ; Arnaud, L. ; Wouters, Y.
Author_Institution
Philips Semicond., Crolles
fYear
2006
fDate
Oct. 16 2006-Sept. 19 2006
Firstpage
134
Lastpage
135
Abstract
Taking into account Matthiessen´s rules, we have developed a model of residual resistivity with line dimensions. The method developed allows distinguishing the effect of impurities and the sizing effect. Thus we are able to determine line dimensions consistent with process variation. Finally this model allows an appreciable evaluation of the TCR
Keywords
electrical conductivity; thermal conductivity; thermal resistance; Matthiessen´s rules; electrical conductivity; line dimensions; residual resistivity model; thermal coefficient of resistance; Conductivity; Copper; Electric resistance; Electrical resistance measurement; Electrons; Equations; Grain boundaries; Impurities; Temperature; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
1-4244-0296-4
Type
conf
DOI
10.1109/IRWS.2006.305227
Filename
4098704
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