• DocumentCode
    3475868
  • Title

    Temperature dependence of Pd thin film cryo resistors

  • Author

    Satrapinski, A. ; Hahtela, O. ; Savin, A.M. ; Novikov, S. ; Lebedeva, N.

  • Author_Institution
    MIKES, Espoo, Finland
  • fYear
    2010
  • fDate
    13-18 June 2010
  • Firstpage
    641
  • Lastpage
    642
  • Abstract
    Cryo resistors based on Pd thin films were designed and investigated in temperature range 50 mK - 300 K. The resistors in the range 100 kΩ - 1.3 MΩ were fabricated using thermal evaporation technique. Minimum temperature coefficient, -0.4 (37)·10-6/K, in temperature range 50 mK - 100 mK has been obtained for 20 nm thin film 560 kΩ resistor. Binary and decimal configuration of connection of resistive elements were used for flexible adjustment of resistance value.
  • Keywords
    cryogenic electronics; palladium; thin film resistors; Pd; Pd thin film cryo resistors; minimum temperature coefficient; resistance 100 kohm to 1.3 Mohm; resistive elements; size 20 nm; temperature 50 mK to 100 mK; temperature 50 mK to 300 K; temperature dependence; thermal evaporation technique; Conductivity; Electrical resistance measurement; Resistors; Semiconductor device measurement; Substrates; Temperature dependence; Temperature distribution; Thermal resistance; Thickness measurement; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements (CPEM), 2010 Conference on
  • Conference_Location
    Daejeon
  • Print_ISBN
    978-1-4244-6795-2
  • Type

    conf

  • DOI
    10.1109/CPEM.2010.5544226
  • Filename
    5544226
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3475868