• DocumentCode
    3476119
  • Title

    Frequency-dependent reluctance extraction

  • Author

    Luk, C. ; Tsung-Hao Chen ; Chen, C.C.-P.

  • Author_Institution
    Optimal corporation
  • fYear
    2004
  • fDate
    27-30 Jan. 2004
  • Firstpage
    793
  • Lastpage
    798
  • Abstract
    A new methodology is presented to captiire high frequency effects of interconnect, namely skin and proximity by using the reluctance (inverse inductance) method. As demonstrated in numerous publications that the reluctance method exhibits excellent locality and suitability of sparsification. The reluctance method results in great benefit in terms of efficiency of extraction and simulation. Mast of the previous studies described the reluctance extraction method without t,aking frequency dependent effects into consideration. In this paper, we first show the differences in frequency response between formula-based inductance extraction and frequency dependent inductance extraction to demonstrate the need to capture high frequency effect. Then a novel frequency dependent reluctance extraction method is proposed by using a robust windowing policy, which is able to handle irregular geometries in VLSI applications. Experimental results demonstrate the superior runtime and accuracy over traditional partial inductance extraction.
  • Keywords
    Conductors; Equivalent circuits; Frequency dependence; Frequency response; Inductance; Integrated circuit interconnections; Proximity effect; Signal design; Skin; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2004. Proceedings of the ASP-DAC 2004. Asia and South Pacific
  • Conference_Location
    Yohohama, Japan
  • Print_ISBN
    0-7803-8175-0
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2004.1337702
  • Filename
    1337702