DocumentCode
3476119
Title
Frequency-dependent reluctance extraction
Author
Luk, C. ; Tsung-Hao Chen ; Chen, C.C.-P.
Author_Institution
Optimal corporation
fYear
2004
fDate
27-30 Jan. 2004
Firstpage
793
Lastpage
798
Abstract
A new methodology is presented to captiire high frequency effects of interconnect, namely skin and proximity by using the reluctance (inverse inductance) method. As demonstrated in numerous publications that the reluctance method exhibits excellent locality and suitability of sparsification. The reluctance method results in great benefit in terms of efficiency of extraction and simulation. Mast of the previous studies described the reluctance extraction method without t,aking frequency dependent effects into consideration. In this paper, we first show the differences in frequency response between formula-based inductance extraction and frequency dependent inductance extraction to demonstrate the need to capture high frequency effect. Then a novel frequency dependent reluctance extraction method is proposed by using a robust windowing policy, which is able to handle irregular geometries in VLSI applications. Experimental results demonstrate the superior runtime and accuracy over traditional partial inductance extraction.
Keywords
Conductors; Equivalent circuits; Frequency dependence; Frequency response; Inductance; Integrated circuit interconnections; Proximity effect; Signal design; Skin; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2004. Proceedings of the ASP-DAC 2004. Asia and South Pacific
Conference_Location
Yohohama, Japan
Print_ISBN
0-7803-8175-0
Type
conf
DOI
10.1109/ASPDAC.2004.1337702
Filename
1337702
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