Title :
Interfacial reactions of co-electrodeposited eutectic Au-Sn solder bumps on Ni and Cu substrates
Author :
Mingling Huang ; Tongxin Zhang ; Ning Zhao ; Tingting Jiao
Author_Institution :
Lab. of Electron. Packaging Mater., Dalian Univ. of Technol., Dalian, China
Abstract :
Co-electrodeposition is an economic and effective method to prepare Au-Sn solder bumps. Au-Sn solder bumps were prepared in a non-cyanide sulfite-pyrophosphate Au-Sn electroplating bath in the present work. The content of Sn in the deposited Au-Sn solder bumps was precisely controlled to be 30 at.%, i.e., Au-Sn eutectic composition. The interfacial reactions of the co-electrodeposited eutectic Au-30at.%Sn solder bumps on Cu and Ni substrates were investigated. (Ni, Au)3Sn2 intermetallic compound (IMC) formed at the Au-30at.%Sn/Ni interface, while two IMC layers, i.e., (Au, Cu)5Sn close to the solder matrix and AuCu close to the Cu substrate, formed at the Au-30at.%Sn/Cu interface. The co-electrodeposited eutectic Au-30at.%Sn solder bumps exhibited good solderabilities on both Ni and Cu substrates.
Keywords :
copper; electrodeposition; electroplating; eutectic alloys; gold alloys; nickel; solders; tin alloys; (NiAu)3Sn2; Au-Sn; Cu; IMC; Ni; coelectrodeposited eutectic solder bumps; interfacial reactions; intermetallic compound; noncyanide sulfite-pyrophosphate electroplating bath; solder matrix; Gold; Microstructure; Nickel; Reflow soldering; Substrates; Tin; co-electrodeposition; eutectic Au-30at.%Sn; interfacial reaction; non-cyanide; solder bumps;
Conference_Titel :
Electronic Packaging Technology (ICEPT), 2013 14th International Conference on
Conference_Location :
Dalian
DOI :
10.1109/ICEPT.2013.6756459