None-touched Near-field Optical Nanolithography

Author

Chen, S.C. ; Chang, T.M. ; Chiu, K.P. ; Tsai, D.P.

Author_Institution

Dept. of Electr. Eng., Far East Coll., Tainan

fYear

2006

fDate

Sept. 2006

Firstpage

83

Lastpage

84

Abstract

Silver nanorods have an excellent effect on the transmitted wave localizing, especially, the intensity of the transmitted wave is strong enough below the bottom of the nanorods. Based on this property, we offer a non-touched optical nanolithographic imaging method, and the structure of the mask is made by silver nanorods which are embedded in a silica block. We numerically prove the availability of the nanolithography in visible domain, and a high resolution of nanolithographic image can be built by a multi-exposures process

Keywords

finite difference time-domain analysis; image resolution; masks; nanolithography; nanostructured materials; photolithography; silver; 3D FDTD method; Ag; mask structure; multiexposure process; nanolithographic image resolution; near-field optical nanolithography; silica block; silver nanorods; transmitted wave intensity; transmitted wave localization; visible domain; Availability; Nanolithography; Optical arrays; Optical imaging; Optical sensors; Plasmons; Polarization; Shape control; Silicon compounds; Silver;

fLanguage

English

Publisher

ieee

Conference_Titel

Numerical Simulation of Semiconductor Optoelectronic Devices, 2006. NUSOD '06. International Conference on

Conference_Location

Nanyang Technological University, Nanyang Executive Centre, Singapore, China

Print_ISBN

0-7803-9755-X

Type

conf

DOI

10.1109/NUSOD.2006.306752

Filename

4098792