Title :
None-touched Near-field Optical Nanolithography
Author :
Chen, S.C. ; Chang, T.M. ; Chiu, K.P. ; Tsai, D.P.
Author_Institution :
Dept. of Electr. Eng., Far East Coll., Tainan
Abstract :
Silver nanorods have an excellent effect on the transmitted wave localizing, especially, the intensity of the transmitted wave is strong enough below the bottom of the nanorods. Based on this property, we offer a non-touched optical nanolithographic imaging method, and the structure of the mask is made by silver nanorods which are embedded in a silica block. We numerically prove the availability of the nanolithography in visible domain, and a high resolution of nanolithographic image can be built by a multi-exposures process
Keywords :
finite difference time-domain analysis; image resolution; masks; nanolithography; nanostructured materials; photolithography; silver; 3D FDTD method; Ag; mask structure; multiexposure process; nanolithographic image resolution; near-field optical nanolithography; silica block; silver nanorods; transmitted wave intensity; transmitted wave localization; visible domain; Availability; Nanolithography; Optical arrays; Optical imaging; Optical sensors; Plasmons; Polarization; Shape control; Silicon compounds; Silver;
Conference_Titel :
Numerical Simulation of Semiconductor Optoelectronic Devices, 2006. NUSOD '06. International Conference on
Conference_Location :
Nanyang Technological University, Nanyang Executive Centre, Singapore, China
Print_ISBN :
0-7803-9755-X
DOI :
10.1109/NUSOD.2006.306752
