DocumentCode :
3478442
Title :
Ionizing radiation induced leakage current in the PD-SOI devices with different layout structures
Author :
Liu Yuan ; He Yu-Juan ; En Yun-Fei ; Shi Qian
Author_Institution :
Electron. Component Lab., Sci. & Technol. on Reliability Phys. & Applic., Guangzhou, China
fYear :
2013
fDate :
3-5 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
Total dose dependence of leakage current in the partially depleted SOI devices with different layout structures are presented. The experimental results show that the leakage currents in the irradiated PD-SOI device with standard structure are significant affected by trench sidewall leakage, but the leakage currents in the enclosed gate and H gate structures are more affected by the conduction of back gate parasitic transistor and gate induced drain leakage currents.
Keywords :
elemental semiconductors; radiation hardening (electronics); silicon-on-insulator; transistors; H gate structure; back gate parasitic transistor conduction; enclosed gate structure; gate-induced drain leakage current; ionizing radiation-induced leakage current; irradiated PD-SOI device; layout structures; partially-depleted SOI devices; total dose dependence; trench sidewall leakage; Silicon on insulator; ionizing radiation; leakage current; partially depleted;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
Conference_Location :
Hong Kong
Type :
conf
DOI :
10.1109/EDSSC.2013.6628221
Filename :
6628221
Link To Document :
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