DocumentCode :
3478583
Title :
Mechanisms of elemental contamination in ion implantation equipment
Author :
Wauk, Michael T. ; Murrell, A. ; Wagner, D. ; Edwards, P.
Author_Institution :
Implant Div., Appl. Mater., Horsham, UK
fYear :
1996
fDate :
16-21 Jun 1996
Firstpage :
117
Lastpage :
120
Abstract :
This paper will survey 10 different mechanisms for producing elemental implanted and surface contaminants in implantation tools, and outline the tool design methods for avoiding the contaminants. These considerations also help us to improve the techniques used for surface analysis
Keywords :
ion implantation; surface contamination; elemental contamination; ion implantation equipment; surface analysis; tool design; Artificial intelligence; Electrodes; Implants; Interference; Ion implantation; Iron; Pollution measurement; Sputtering; Surface contamination; Wheels;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
Type :
conf
DOI :
10.1109/IIT.1996.586146
Filename :
586146
Link To Document :
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