• DocumentCode
    3478583
  • Title

    Mechanisms of elemental contamination in ion implantation equipment

  • Author

    Wauk, Michael T. ; Murrell, A. ; Wagner, D. ; Edwards, P.

  • Author_Institution
    Implant Div., Appl. Mater., Horsham, UK
  • fYear
    1996
  • fDate
    16-21 Jun 1996
  • Firstpage
    117
  • Lastpage
    120
  • Abstract
    This paper will survey 10 different mechanisms for producing elemental implanted and surface contaminants in implantation tools, and outline the tool design methods for avoiding the contaminants. These considerations also help us to improve the techniques used for surface analysis
  • Keywords
    ion implantation; surface contamination; elemental contamination; ion implantation equipment; surface analysis; tool design; Artificial intelligence; Electrodes; Implants; Interference; Ion implantation; Iron; Pollution measurement; Sputtering; Surface contamination; Wheels;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. Proceedings of the 11th International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-3289-X
  • Type

    conf

  • DOI
    10.1109/IIT.1996.586146
  • Filename
    586146
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3478583