Title :
Study of TSV leakage current and breakdown voltage
Author :
Yichao Xu ; Guanjiang Wang ; Yichao Xu ; Xin Sun ; Runiu Fang ; Min Miao ; Yufeng Jin
Author_Institution :
Shenzhen Grad. Sch., Peking Univ., Shenzhen, China
Abstract :
Three potential contributing factors to the TSV leakage and breakdown are discussed and analyzed in this study. In addition, an in-line testing methodology is put forward so that leakage and breakdown data could be easily obtained. Finite element method simulation was used to illustrate the testing principle, and experimental test were carried out for validation. It was found that the most contributing factor to the TSV leakage and breakdown is the uniformity of the insulator layer thickness, while via-diameter and pitch between TSVs are factors of failure mechanism of the low-frequency characteristics.
Keywords :
electric breakdown; finite element analysis; integrated circuit testing; leakage currents; three-dimensional integrated circuits; TSV breakdown voltage; TSV leakage current; failure mechanism; finite element method simulation; in-line testing methodology; insulator layer thickness; low-frequency characteristic; Electric breakdown; Insulators; Leakage currents; Testing; Three-dimensional displays; Through-silicon vias; 3D IC; TSV; breakdown voltage; insulation integrity; leakage current;
Conference_Titel :
Electronic Packaging Technology (ICEPT), 2013 14th International Conference on
Conference_Location :
Dalian
DOI :
10.1109/ICEPT.2013.6756512