DocumentCode
3479238
Title
Micro uniformity in MeV implantation
Author
Heden, Craig ; Davis, Bill ; Heckman, Valarie ; Weisenberger, Wes ; McMillen, James A.
Author_Institution
Ion Implant Services, Sunnyvale, CA, USA
fYear
1996
fDate
16-21 Jun 1996
Firstpage
226
Lastpage
228
Abstract
Mechanically caused nonuniformity of low dose, high energy implants in the form of striping has been detected in unprecedented detail using a high resolution optical testing technique. A comparison between optical monitoring and 4 point probe contour mapping in detecting this problem is presented. A description of the mechanical problem on the implanter is described and recommendations for planned maintenance and testing for all mechanically scanned implanters in general which perform low dose implants is suggested
Keywords
ion implantation; four point probe contour mapping; low dose high energy ion implantation; maintenance; mechanical scanning; micro uniformity; optical testing; striping; Computer aided software engineering; High speed optical techniques; Implants; Ion beams; Monitoring; Optical films; Performance evaluation; Probes; Testing; Wheels;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586191
Filename
586191
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