Title :
Lithography in a 300 mm pilot production line
Author :
Ganz, D. ; Charles, A. ; Grant, L. ; Hornig, S. ; Hraschan, G. ; Maltabes, J. ; Metzdorf, T. ; Otto, R. ; Schedel, T. ; Schmidt, S. ; Schuster, R.
Author_Institution :
Semicond. 300, Dresden, Germany
Abstract :
This paper discusses the performance of the initial 300 mm lithography tool set installed in a pilot line in Dresden, Germany. The product used for evaluating and debugging the tool set is a 0.25-micron ground rule 64 M DRAM. This was chosen for the ability to benchmark against 200 mm DRAM manufacturing data. We have produced several lots of wafers with measurable yield. These lots have produced data on overlay, CD and run to run performance of the lithography tools on actual products
Keywords :
DRAM chips; integrated circuit yield; ultraviolet lithography; 0.25 micron; 300 mm; 64 Mbit; CD; DRAM; DUV lithography; benchmarking; debugging; lithography tool set; manufacturing data; measurable yield; overlay; pilot line; run to run performance; Coatings; Counting circuits; Debugging; Large Hadron Collider; Lithography; Production; Random access memory; Table lookup; Testing; Vehicles;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808810
