Title :
Novel darkfield patterned inspection system with killer defect control
Author :
Sugimoto, Akihiro ; Ikota, Mlasami ; Enomoto, Yoslinobu
Author_Institution :
Device Dev. Center, Hitachi Ltd., Tokyo, Japan
Abstract :
Darkfield defect inspection systems are widely used for inline monitoring since their sampling ratio is high. For yield ramp up it is necessary to combine the enormous amounts of inspection data with defect sources. In this paper we propose a data riddling method for darkfield defect inspection systems with high sensitivity and high throughput. This method consists of a fatality recognition function and a defect size measurement function
Keywords :
inspection; integrated circuit measurement; integrated circuit yield; large scale integration; process monitoring; darkfield patterned inspection system; data riddling method; defect size measurement function; defect sources; fatality recognition function; inline monitoring; inspection data; killer defect control; sampling ratio; sensitivity; throughput; yield ramp up; Control systems; Image resolution; Inspection; Lenses; Monitoring; Size measurement; Throughput; Tires;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808815
