DocumentCode
3481457
Title
Practical techniques for optical characterization of III-V heterostructures
Author
Wicks, G.W.
Author_Institution
Inst. of Opt., Rochester Univ., NY, USA
Volume
2
fYear
1994
fDate
31 Oct-3 Nov 1994
Firstpage
29
Abstract
This paper discusses two optical measurements, photoluminescence (PL) and Raman spectroscopies, and their use for analysis of the structure of III-V heterointerfaces grown by molecular beam epitaxy and organo-metallic vapor phase epitaxy. The emphasis here is on using these techniques in ways that require only simple, semi-quantitative analyses. The simple analyses enable rapid determinations of the structures of samples. The quick turn around time of the measurements and conclusions makes it possible to optimize the epitaxial growth by iterating the cycle of grow/characterize/regrow rapidly enough (a few cycles/day), so that the conditions in the epitaxial reactor do not drift appreciably
Keywords
III-V semiconductors; GaAs-AlGaAs; III-V heterostructures; Raman spectroscopies; epitaxial growth; epitaxial reactor; grow/characterize/regrow; iterating; molecular beam epitaxy; optical characterization; optical measurements; organo-metallic vapor phase epitaxy; photoluminescence; rapid determination; semi-quantitative analyses; structure determination; Acoustic measurements; Atom optics; Epitaxial growth; III-V semiconductor materials; Optical scattering; Optical superlattices; Phonons; Photonic band gap; Raman scattering; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1994. LEOS '94 Conference Proceedings. IEEE
Conference_Location
Boston, MA
Print_ISBN
0-7803-1470-0
Type
conf
DOI
10.1109/LEOS.1994.586297
Filename
586297
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