• DocumentCode
    3481457
  • Title

    Practical techniques for optical characterization of III-V heterostructures

  • Author

    Wicks, G.W.

  • Author_Institution
    Inst. of Opt., Rochester Univ., NY, USA
  • Volume
    2
  • fYear
    1994
  • fDate
    31 Oct-3 Nov 1994
  • Firstpage
    29
  • Abstract
    This paper discusses two optical measurements, photoluminescence (PL) and Raman spectroscopies, and their use for analysis of the structure of III-V heterointerfaces grown by molecular beam epitaxy and organo-metallic vapor phase epitaxy. The emphasis here is on using these techniques in ways that require only simple, semi-quantitative analyses. The simple analyses enable rapid determinations of the structures of samples. The quick turn around time of the measurements and conclusions makes it possible to optimize the epitaxial growth by iterating the cycle of grow/characterize/regrow rapidly enough (a few cycles/day), so that the conditions in the epitaxial reactor do not drift appreciably
  • Keywords
    III-V semiconductors; GaAs-AlGaAs; III-V heterostructures; Raman spectroscopies; epitaxial growth; epitaxial reactor; grow/characterize/regrow; iterating; molecular beam epitaxy; optical characterization; optical measurements; organo-metallic vapor phase epitaxy; photoluminescence; rapid determination; semi-quantitative analyses; structure determination; Acoustic measurements; Atom optics; Epitaxial growth; III-V semiconductor materials; Optical scattering; Optical superlattices; Phonons; Photonic band gap; Raman scattering; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1994. LEOS '94 Conference Proceedings. IEEE
  • Conference_Location
    Boston, MA
  • Print_ISBN
    0-7803-1470-0
  • Type

    conf

  • DOI
    10.1109/LEOS.1994.586297
  • Filename
    586297