• DocumentCode
    3481707
  • Title

    General scaling of pulse shortening in explosive-emission-driven microwave sources

  • Author

    Benford, James ; Price, David

  • Author_Institution
    Microwave Sci. Inc., Lafayette, CA, USA
  • Volume
    2
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    691
  • Abstract
    Microwave generation in devices that depend on synchronization between an electron beam and a resonant cavity or slow wave structure can be disrupted by changes in either. Explosive-emission-driven microwave sources use plasma as the electron source in the diode. This plasma is conductive enough to act as the boundary for both the applied diode voltage and the microwave electric field. The motion of this plasma can effectively change the dimensions of either the electron beam diode or the cavity and will thereby cause resonance destruction. This shortens the microwave pulse length τμ. Using simple models of cathode plasma motion and plasma speed dependence on diode current, we derive a scaling relation between microwave power and microwave pulse length. This general model of the process predicts that, for a Child-Langmuir diode, microwave power falls as P∝τμ-5/3 and that pulse energy falls as E∝τμ-2/3. Therefore, energy efficiency declines as the pulse length is extended. We compare with data from magnetrons, MILOs and BWOs, with good agreement. Explosive-emission-driven microwave sources are fundamentally limited by the speed of the diode plasma and can be improved by finding cathode materials that generate slower plasmas
  • Keywords
    electron field emission; magnetrons; microwave generation; plasma diodes; pulse generators; Child-Langmuir diode; applied diode voltage; cathode plasma motion; diode plasma; electron beam diode; energy efficiency; explosive-emission-driven microwave sources; microwave electric field; plasma speed dependence; pulse shortening; resonance destruction; resonant cavity; synchronization; Cathodes; Diodes; Electron beams; Microwave devices; Microwave generation; Plasma devices; Plasma materials processing; Plasma sources; Plasma waves; Resonance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams, 1998. BEAMS '98. Proceedings of the 12th International Conference on
  • Conference_Location
    Haifa
  • Print_ISBN
    0-7803-4287-9
  • Type

    conf

  • DOI
    10.1109/BEAMS.1998.816947
  • Filename
    816947