The influence of the substrate temperature during the pulse laser deposition on the YBCO thin films revealed by AFM

Author

Rau, Svetlana ; Nastase, Nicoleta ; Trtik, V. ; Varela, M. ; Sanchez, F. ; Nastase, S.

Author_Institution

Nat. Inst. for Res. & Dev. for Microtechnol., Bucharest, Romania

Volume

1

fYear

1999

fDate

1999

Firstpage

221

Abstract

The results obtained by atomic force microscopy (AFM) characterisation of high temperature superconducting (HTS) YBCO thin films, pulse laser deposited (PLD) on a heated LaAlO₃ substrate, are presented. An KrF excimer laser beam was used for the thin film PLD (ablation) in reactive vacuum. The analysed thin films were grown on the same substrate which, because of the glue, was at different thermal conditions. It was found that the film with a slightly lower substrate temperature has not completely switched to the orthorhombic structure and the electrical characteristics of the two thin films are significantly different

Keywords

atomic force microscopy; barium compounds; high-temperature superconductors; pulsed laser deposition; superconducting thin films; yttrium compounds; AFM; KrF excimer laser beam; LaAlO₃; YBa₂Cu₃O₇; ablation; heated LaAlO₃ substrate; high temperature superconductors; pulsed laser deposition; reactive vacuum; substrate temperature; thin films; Atomic beams; Atomic force microscopy; Atomic layer deposition; High temperature superconductors; Laser ablation; Optical pulses; Pulsed laser deposition; Substrates; Superconducting thin films; Yttrium barium copper oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International

Conference_Location

Sinaia

Print_ISBN

0-7803-5139-8

Type

conf

DOI

10.1109/SMICND.1999.810502

Filename

810502