Title :
XRD study of gas sensitive SnO/sub 2/ thin films deposited by spray pyrolysis method
Author :
Korotcenkov, G. ; Schwank, J. ; DiBattista, M. ; Brinzari, V.
Author_Institution :
Dept. of Microelectron., Tech. Univ., Chisinau, Moldova
Abstract :
The results of research of SnO2 thin film structure using XRD diffraction is presented in this report. We discuss the influence of conditions of film deposition and modes of heat treatment in the range of temperatures 400-900°C on crystallite size and predominant orientation. It was determined that SnO2 films, deposited by spray pyrolysis method are textured polycrystalline films with nano-size crystallites (t=8-20 nm). Predominant orientation of crystallites ((110) or (200)), forming the gas sensitive surface, depends on film thickness and used modes of deposition. We also have shown that the structure of studied SnO2 films was very stable in oxygen atmosphere
Keywords :
X-ray diffraction; gas sensors; semiconductor growth; semiconductor materials; semiconductor thin films; spray coatings; tin compounds; 400 to 900 C; 8 to 20 nm; SnO/sub 2/; XRD; crystallite size; film deposition; gas sensitive SnO/sub 2/ thin films; heat treatment; nano-size crystallites; predominant orientation; spray pyrolysis method; thin film structure; Atmosphere; Crystallization; Diffraction; Heat treatment; Spraying; Surface treatment; Temperature distribution; Temperature sensors; Transistors; X-ray scattering;
Conference_Titel :
Semiconductor Conference, 1999. CAS '99 Proceedings. 1999 International
Conference_Location :
Sinaia, Romania
Print_ISBN :
0-7803-5139-8
DOI :
10.1109/SMICND.1999.810527
