DocumentCode :
3482525
Title :
Propagation of stress wave in nickel single crystals nanofilm via molecular dynamics
Author :
Jia, Yan ; Liu, Heng ; Yu, Lie
Author_Institution :
Inst. of Mechatron. & Inf. Syst., Xi´´an Jiaotong Univ., Xi´´an, China
fYear :
2009
fDate :
5-7 Aug. 2009
Firstpage :
1396
Lastpage :
1400
Abstract :
Stress wave propagation is examined in nickel single crystals nano-film using molecular dynamics. The x, y and z direction correspond to the crystallographic orientation [100], [011] and [0-11], respectively. Two kind of shear stress is loaded along x-axis, which is also loaded along z-axis. One is the 0.36 Gpa square pulse shear stress, which can be maintained 1 ps, and the other is the 0.36 Gpa constant shear stress. The simulation result shows that the stress transfer in the metal film is according to the way of wave, and there is time lag in the progress of stress wave propagation. The properties of wave reflected from fixed and free end are different. The stress reversal is a characteristic of the free end, and the stress multiplication phenomenon is a characteristic of the fixed end. The wave speed is different, as the stress wave propagates along the different lattice direction. This is consistent with the macroscopic conclusion.
Keywords :
crystal orientation; elastic waves; internal stresses; metallic thin films; molecular dynamics method; nanostructured materials; nickel; Ni; crystallographic orientation; metal film; molecular dynamics; nanofilm; nickel single crystals; shear stress; stress multiplication phenomenon; stress reversal; stress wave propagation; Computer simulation; Crystalline materials; Crystallography; Crystals; Grain boundaries; Lattices; Manufacturing; Nickel; Shock waves; Stress; molecular dynamics; nanofilm; stress wave;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Automation and Logistics, 2009. ICAL '09. IEEE International Conference on
Conference_Location :
Shenyang
Print_ISBN :
978-1-4244-4794-7
Electronic_ISBN :
978-1-4244-4795-4
Type :
conf
DOI :
10.1109/ICAL.2009.5262755
Filename :
5262755
Link To Document :
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