Low energy beam extraction in terms of magnetic field, electric field and ion optics

Author

Ito, Hiroyuki ; Bryan, Neil

Author_Institution

Implant Div., Appl. Mater., Horsham, UK

fYear

1996

fDate

16-21 Jun 1996

Firstpage

383

Lastpage

386

Abstract

Improving low energy beam performance has been one of the most important technological challenges for ion implanters in order to maximize the throughput for shallow junction applications. Major difficulties in obtaining high current beams at low energy can be attributed to high beam divergence due to the intrinsic emittance growth and high space charge at the extraction region. This paper identifies the various problems associated with low energy beam extraction and transport and proposes possible solutions in terms of source plasma, extraction optics and magnetic field

Keywords

beam handling techniques; electric fields; ion beams; ion implantation; ion optics; magnetic fields; particle beam extraction; space charge; beam divergence; electric field; extraction optics; high current beams; intrinsic emittance growth; ion implanters; ion optics; low energy beam extraction; low energy beam transport; magnetic field; ray trace simulation; shallow junction applications; source plasma; space charge; throughput maximization; Equations; Ion beams; Magnetic fields; Magnetic materials; Particle beam optics; Particle beams; Plasma density; Plasma sources; Space charge; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. Proceedings of the 11th International Conference on

Conference_Location

Austin, TX

Print_ISBN

0-7803-3289-X

Type

conf

DOI

10.1109/IIT.1996.586355

Filename

586355