• DocumentCode
    3482742
  • Title

    Bernas source for the Precision Implant 9200

  • Author

    Vella, M.C. ; Hacker, W. ; Price, S.W. ; Reilly, Tom

  • Author_Institution
    Electro-Graph, Carlsbad, CA, USA
  • fYear
    1996
  • fDate
    16-21 Jun 1996
  • Firstpage
    394
  • Lastpage
    395
  • Abstract
    A Bernas plasma source is in beta testing for the Applied Materials Precision Implant 9000/9200 series. The most distinctive feature of this source is a new two and a half turn pigtail filament. Compared with a Sigma Freeman, initial Bernas operation with P+ , B+ and BF2+ has demonstrated spec beam with higher transfer ratios and double source life for a range of high current, low energy processes
  • Keywords
    beam handling techniques; ion implantation; ion sources; particle beam diagnostics; plasma production; 20 keV; Applied Materials Precision Implant 9000/9200 series; B; B+; BF2; BF2+; Bernas plasma source; P; P+; beam currents; beta testing; double source life; high current low energy processes; pigtail filament; transfer ratios; Implants; Insulation; Magnetic fields; Materials testing; Plasma sources; Power supplies; Reproducibility of results; Stability; Tungsten; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. Proceedings of the 11th International Conference on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-3289-X
  • Type

    conf

  • DOI
    10.1109/IIT.1996.586363
  • Filename
    586363
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3482742