DocumentCode :
3483036
Title :
A fast-response dual-crucible vaporizer for the Genus 1510/1520 MeV ion implanters
Author :
LaFontaine, M. ; Sakase, T. ; Tokoro, N. ; Campbell, S. ; Quattrini, V. ; Alteriso, G.
Author_Institution :
Ion Technol. Div., Genus Inc., Newburyport, MA, USA
fYear :
1996
fDate :
16-21 Jun 1996
Firstpage :
411
Lastpage :
413
Abstract :
A new vaporizer has been developed for the Bernas ion source and PIG ion source used in the Genus 1510 and 1520 high-energy ion implanters to increase machine utilization. The new design has two independent crucibles. Each crucible capacity has been significantly increased over that of the previous single-crucible design, resulting in longer source life. Finite-element analysis (FEA) was used to minimize the thermal mass of the design, resulting in fast heatup and cooldown times. Differing species may be loaded into each crucible. Temperature uniformity through the active crucible is good. FEA was also used to minimize thermal fatigue in the body for long service life. Each crucible temperature is tightly controlled using a dedicated heater and cooler and a controller utilizing the proportional-integral-derivative (PID) technique
Keywords :
finite element analysis; ion implantation; vaporisation; 1510 MeV; 1520 MeV; Bernas ion source; Genus ion implanter; PID controller; PIG ion source; fast-response dual-crucible vaporizer; finite-element analysis; high-energy ion implantation; service life; temperature uniformity; thermal fatigue; thermal mass; Cooling; Fatigue; Heating; Ion sources; Lamps; Pi control; Proportional control; Solids; Temperature control; Three-term control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
Type :
conf
DOI :
10.1109/IIT.1996.586379
Filename :
586379
Link To Document :
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