DocumentCode
3483036
Title
A fast-response dual-crucible vaporizer for the Genus 1510/1520 MeV ion implanters
Author
LaFontaine, M. ; Sakase, T. ; Tokoro, N. ; Campbell, S. ; Quattrini, V. ; Alteriso, G.
Author_Institution
Ion Technol. Div., Genus Inc., Newburyport, MA, USA
fYear
1996
fDate
16-21 Jun 1996
Firstpage
411
Lastpage
413
Abstract
A new vaporizer has been developed for the Bernas ion source and PIG ion source used in the Genus 1510 and 1520 high-energy ion implanters to increase machine utilization. The new design has two independent crucibles. Each crucible capacity has been significantly increased over that of the previous single-crucible design, resulting in longer source life. Finite-element analysis (FEA) was used to minimize the thermal mass of the design, resulting in fast heatup and cooldown times. Differing species may be loaded into each crucible. Temperature uniformity through the active crucible is good. FEA was also used to minimize thermal fatigue in the body for long service life. Each crucible temperature is tightly controlled using a dedicated heater and cooler and a controller utilizing the proportional-integral-derivative (PID) technique
Keywords
finite element analysis; ion implantation; vaporisation; 1510 MeV; 1520 MeV; Bernas ion source; Genus ion implanter; PID controller; PIG ion source; fast-response dual-crucible vaporizer; finite-element analysis; high-energy ion implantation; service life; temperature uniformity; thermal fatigue; thermal mass; Cooling; Fatigue; Heating; Ion sources; Lamps; Pi control; Proportional control; Solids; Temperature control; Three-term control;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586379
Filename
586379
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