Title :
TM-pass polarizer based on a photobleaching-induced waveguide in polymers
Author :
Sang-Shin Lee ; Garner, S. ; Antao Chen ; Chuyanov, V. ; Steier, W.H. ; Seh-Won Ahn ; Sang-Yung Shin
Author_Institution :
Devices & Mater. Lab., LG Corp. Inst. of Technol., Seoul, South Korea
fDate :
Aug. 30 1999-Sept. 3 1999
Abstract :
A polymer TM-pass polarizer is demonstrated by integrating photobleaching (PB) waveguides, which support only the TM mode, with mode-matched rib waveguides formed by reactive ion etching (RIE). The input and output rib guides support both TE and TM modes. The PB can be controlled to closely match the mode profile of the photobleached guide to the mode profile of the input and output rib waveguides in order to reduce the insertion loss. The polymer selected for photo-bleaching was PMMA-DRI. This electrooptic polymer has a PMMA backbone with the azo dye Disperse Red I side chain attached to the backbone.
Keywords :
dyes; filled polymers; integrated optics; optical fabrication; optical polarisers; optical polymers; optical saturable absorption; optical waveguides; rib waveguides; sputter etching; PMMA backbone; PMMA-DRI; TE mode; TM mode; TM-pass polarizer; azo dye Disperse Red I side chain; electrooptic polymer; input rib guides; insertion loss; mode profile; mode-matched rib waveguides; output rib guides; photobleached guide; photobleaching-induced waveguide; polymers; reactive ion etching; Birefringence; Bleaching; Etching; Extinction ratio; Optical fiber polarization; Optical waveguides; Photobleaching; Polymers; Refractive index; Tellurium;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
DOI :
10.1109/CLEOPR.1999.811406
