Title :
Deposition of carbon nitride films by laser techniques
Author :
Jelinek, M. ; Popov, C. ; Lancok, J.
Author_Institution :
Inst. of Phys., Czechoslovak Acad. of Sci., Prague, Czech Republic
fDate :
Aug. 30 1999-Sept. 3 1999
Abstract :
Summary form only given. Besides the standard thin film deposition methods, laser techniques such as pulsed laser deposition (PLD) and laser-induced chemical vapor deposition (LCVD) have also been applied for synthesis of superhard carbon nitride films (CNx). The aim of the present study is to compare the results for deposition rate, composition and bonding structure of CN/sub x/ films prepared by KrF excimer PLD of graphite, combined with pulse modulated RF discharge, and by laser-induced CVD by CuBr vapor laser from the system NH/sub 3//CCl/sub 4/ as well as to explain the observed differences from the viewpoint of the process mechanisms.
Keywords :
carbon compounds; chemical vapour deposition; optical fabrication; optical films; pulsed laser deposition; C/sub 3/N/sub 4/; CuBr; CuBr vapor laser; KrF excimer PLD; NH/sub 3/; bonding structure; carbon nitride films; composition; deposition rate; graphite; laser deposition techniques; laser-induced CVD; laser-induced chemical vapor deposition; process mecchanisms; pulse modulated RF discharge; pulsed laser deposition; standard thin film deposition methods; superhard carbon nitride film; Chemical lasers; Laser ablation; Laser theory; Optical pulses; Power lasers; Pulse modulation; Pulsed laser deposition; Radio frequency; Substrates;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
DOI :
10.1109/CLEOPR.1999.811473
