Deposition of carbon nitride films by laser techniques

Author

Jelinek, M. ; Popov, C. ; Lancok, J.

Author_Institution

Inst. of Phys., Czechoslovak Acad. of Sci., Prague, Czech Republic

Volume

2

fYear

1999

fDate

Aug. 30 1999-Sept. 3 1999

Abstract

Summary form only given. Besides the standard thin film deposition methods, laser techniques such as pulsed laser deposition (PLD) and laser-induced chemical vapor deposition (LCVD) have also been applied for synthesis of superhard carbon nitride films (CNx). The aim of the present study is to compare the results for deposition rate, composition and bonding structure of CN/sub x/ films prepared by KrF excimer PLD of graphite, combined with pulse modulated RF discharge, and by laser-induced CVD by CuBr vapor laser from the system NH/sub 3//CCl/sub 4/ as well as to explain the observed differences from the viewpoint of the process mechanisms.

Keywords

carbon compounds; chemical vapour deposition; optical fabrication; optical films; pulsed laser deposition; C/sub 3/N/sub 4/; CuBr; CuBr vapor laser; KrF excimer PLD; NH/sub 3/; bonding structure; carbon nitride films; composition; deposition rate; graphite; laser deposition techniques; laser-induced CVD; laser-induced chemical vapor deposition; process mecchanisms; pulse modulated RF discharge; pulsed laser deposition; standard thin film deposition methods; superhard carbon nitride film; Chemical lasers; Laser ablation; Laser theory; Optical pulses; Power lasers; Pulse modulation; Pulsed laser deposition; Radio frequency; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on

Conference_Location

Seoul, South Korea

Print_ISBN

0-7803-5661-6

Type

conf

DOI

10.1109/CLEOPR.1999.811473

Filename

811473