The use of a high current implanter for 5E10-E12 dose range implants

The Applied Materials P19500 xR implanter has been designed to cover the three main areas of implanter operation; low dose, high dose and high energies up to 750 keV, thereby reducing the number of implant tools required in a production environment. In this paper, low dose data from the extended dose range of the P19500 xR implanter is presented. Doses down to the 5E10 cm^-2 level have been investigated using Thermawave^TM measurements and implant uniformity and repeatability better than 0.4% have been obtained. An effect due to the wafer surface condition prior to implant has been observed from the thermawave maps. Dose sensitivity data from this and other implants is also reported