DocumentCode
3484481
Title
DMG AlGaN/GaN HEMT: A solution to RF and wireless applications for reduced distortion performance
Author
Kumar, Sona P. ; Agrawal, Anju ; Chaujar, Rishu ; Gupta, Mridula ; Gupta, R.S.
Author_Institution
Dept. of Electron. Sci., Univ. of Delhi, New Delhi
fYear
2008
fDate
16-20 Dec. 2008
Firstpage
1
Lastpage
4
Abstract
The study thus proves that DMG AlGaN/GaN HEMT is a potential candidate for growing requirement of high linearity and low distortion in the telecommunication industry due to reduced SCEs and a more uniform electric field distribution. The study also shows that the linearity performance improves further on using lower doping and thickness of the barrier layer and increased metal gate workfunction difference; thus presenting DMG AlGaN/GaN HEMT as a promising solution for high performance RF applications.
Keywords
aluminium compounds; gallium compounds; high electron mobility transistors; microwave circuits; radiocommunication; AlGaN-GaN; RF applications; distortion performance reduction; dual material gate; telecommunication industry; uniform electric field distribution; wireless applications; Aluminum gallium nitride; Conducting materials; Electrons; Gallium nitride; HEMTs; Linearity; Mobile communication; Radio frequency; Semiconductor device noise; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2008. APMC 2008. Asia-Pacific
Conference_Location
Macau
Print_ISBN
978-1-4244-2641-6
Electronic_ISBN
978-1-4244-2642-3
Type
conf
DOI
10.1109/APMC.2008.4958186
Filename
4958186
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