DocumentCode :
3484864
Title :
Facial marks: Soft biometric for face recognition
Author :
Jain, Anil K. ; Park, Unsang
Author_Institution :
Dept. of Comput. Sci. & Eng., Michigan State Univ., East Lansing, MI, USA
fYear :
2009
fDate :
7-10 Nov. 2009
Firstpage :
37
Lastpage :
40
Abstract :
We propose to utilize micro features, namely facial marks (e.g., freckles, moles, and scars) to improve face recognition and retrieval performance. Facial marks can be used in three ways: i) to supplement the features in an existing face matcher, ii) to enable fast retrieval from a large database using facial mark based queries, and iii) to enable matching or retrieval from a partial or profile face image with marks. We use Active Appearance Model (AAM) to locate and segment primary facial features (e.g., eyes, nose, and mouth). Then, Laplacian-of-Gaussian (LoG) and morphological operators are used to detect facial marks. Experimental results based on FERET (426 images, 213 subjects) and Mugshot (1,225 images, 671 subjects) databases show that the use of facial marks improves the rank-1 identification accuracy of a state-of-the-art face recognition system from 92.96% to 93.90% and from 91.88% to 93.14%, respectively.
Keywords :
Gaussian processes; biometrics (access control); face recognition; image matching; image retrieval; image segmentation; visual databases; FERET database; Laplacian-of-Gaussian operator; Mugshot database; active appearance model; face matching; face recognition; facial marks; large database; morphological operator; partial face image retrieval; primary facial features segmentation; profile face image; rank-1 identification accuracy; soft biometric; Active appearance model; Biometrics; Face detection; Face recognition; Facial features; Image databases; Image retrieval; Image segmentation; Information retrieval; Spatial databases; Active Appearance Model; face recognition; facial marks; local features; soft biometrics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Image Processing (ICIP), 2009 16th IEEE International Conference on
Conference_Location :
Cairo
ISSN :
1522-4880
Print_ISBN :
978-1-4244-5653-6
Electronic_ISBN :
1522-4880
Type :
conf
DOI :
10.1109/ICIP.2009.5413921
Filename :
5413921
Link To Document :
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