DocumentCode :
348487
Title :
The influence of a magnetic field on a crystalline structure of carbon nitride thin films deposition
Author :
Kim, J.I. ; Kudryashov, S.I.
Author_Institution :
Dept. of Chem., Moscow State Univ., Russia
Volume :
1
fYear :
1999
fDate :
Aug. 30 1999-Sept. 3 1999
Firstpage :
82
Abstract :
Carbon nitride (C/sub x/N/sub y/) thin films are grown at room temperature on Si [100] substrates by reactive cathodic sputtering assisted by pulsed laser ablation of a pure graphite target with/without magnetic field assistance. The magnetic field results in an increase of crystallite size in the films due to bombardment of the Si substrates by energetic carbon and nitrogen species generated during cyclomagnetron motion of electrons in the discharge zone. An increase in nitrogen content is accompanied by a decrease in the content of sp/sup 3/-bonded carbon characteristic of the /spl beta/-C/sub 3/N/sub 4/ structure.
Keywords :
X-ray diffraction; carbon compounds; crystallites; magnetic field effects; pulsed laser deposition; scanning electron microscopy; sputter deposition; sputtered coatings; /spl beta/-C/sub 3/N/sub 4/ structure; C/sub x/N/sub y/ thin films; CN; N content; Si; Si [100] substrate; Si substrate bombardment; crystallite size; discharge zone; energetic C species; energetic N species; pulsed laser ablation; pure graphite target; reactive cathodic sputtering; room temperature growth; sp/sup 3/-bonded C content; Crystallization; Laser ablation; Magnetic fields; Magnetic films; Nitrogen; Optical pulses; Semiconductor films; Semiconductor thin films; Sputtering; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
Type :
conf
DOI :
10.1109/CLEOPR.1999.811634
Filename :
811634
Link To Document :
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