Title :
SOI CMOS Technology with 360GHz fT NFET, 260GHz fT PFET, and Record Circuit Performance for Millimeter-Wave Digital and Analog System-on-Chip Applications
Author :
Lee, Sungjae ; Kim, Jonghae ; Kim, Daeik ; Jagannathan, Basanth ; Cho, Choongyeun ; Johnson, Jim ; Dufrene, Brian ; Zamdmer, Noah ; Wagner, Lawrence ; Williams, Richard ; Fried, David ; Rim, Ken ; Pekarik, John ; Springer, Scott ; Plouchart, Jean-Olivier
Author_Institution :
IBM Semicond. R&D Center, Essex Junction
Abstract :
We present record-performance RF devices and circuits for an SOI CMOS technology, at 35 nm Lpoly. Critical RF/analog figure of merits in FET such as current gain cut-off frequency (fT), 1/f noise, and high-frequency noise figure at various bias and temperature conditions are measured and modeled to enable high-performance circuit design. Measurement results show peak fT´s of 340 GHz and 240 GHz for 35 nm Lpoly NFET and PFET, respectively. At sub-35 nm Lpoly, 360 GHz fT NFET and 260 GHz fT PFET are demonstrated. High-Q, high-density vertical native capacitors (VNCAPs) and on-chip inductors are integrated. RF-operable ring oscillator (RFRO) demonstrates a 3.58 psec delay and a SSB phase noise of -107 dBc/Hz at 1 MHz offset. LC-tank VCO operates at 70 GHz with 9.5% tuning range. The maximum operating frequency of a static CML divider is 93 GHz while dissipating 52.4 mW.
Keywords :
CMOS integrated circuits; field effect transistors; inductors; silicon-on-insulator; submillimetre wave circuits; voltage-controlled oscillators; FET; NFET; PFET; RF-operable ring oscillator; SOI CMOS technology; SSB phase noise; VCO; analog system-on-chip applications; frequency 260 GHz; frequency 360 GHz; millimeter-wave digital applications; onchip inductors; record circuit performance; vertical native capacitors; CMOS technology; Circuit noise; Current measurement; Cutoff frequency; FETs; Frequency measurement; Gain measurement; Noise figure; Radio frequency; Temperature measurement;
Conference_Titel :
VLSI Technology, 2007 IEEE Symposium on
Conference_Location :
Kyoto
Print_ISBN :
978-4-900784-03-1
DOI :
10.1109/VLSIT.2007.4339724