Applied Materials xR80S, xRLEAP and xR120S 300 mm Ion Implant Systems

This paper introduces the Applied Materials xR80S, xRLEAP and xR120S 300 mm Batch High Current Ion Implanter. This tool provides a low risk extension to 300 mm with maximum process transparency by sharing a common beamline family with the existing 200 mm products. The small footprint concept of the 200 mm systems has been retained. High productivity is achieved especially for shallow junction formation where the combined superiority of a batch system with the Applied Materials LEAP technology gives greatest advantage